alpha400P

alpha400P Arc Coating System

General Characteristics

With the alpha400P Vacotec encounters into a new dimension of arc coating systems. This compact, fast-cycle coating system proves to be user-friendly having a high deposition rate. In addition to the deposition of hard thin film coatings, this system is also capable of in-situ plasmanitriding. The SPCS technology enables coatings which meet extremely high requirements in smoothness and density.

Application

The alpha400P is intended to be used in the following applications:

in large job-coating centres as a supplement to large volume coaters like the alpha900P
in smaller job-coating centres or with tool manufacturers as a single system for efficient coating of hobs, shaper cutters and all kinds of shaft and forming tools.
In production lines of original equipment manufacturers (OEM) for high throughput of similar parts as integral part of the system.

Technology
The results of many years of coating and technology development as well as of the continuous exchange with our users have been integrated in this new system generation.

By means of the Eifeler technology the following thin films can be deposited reliably and in high quality:

all standard layers like TiN, TiCN, CrN, ZrN, CrCN, TiAlN, AlTiN and advanced hard coatings such as EXXTRAL, VARIANTA, VARIANTIC, SUPRAL and KORAL
nano-structured layers like EXXTRAL PLUS, EXTRALL PLUS/EXX, EXTRAL silver, TIGRAL and SISTRAL
WC-based solid lubricants such as WC/C (also deposited by arc evaporation).

Technique
High-performance vacuum pumps and radiant heaters provide a rapid conditioning of the tools and thus allow for short cycle times. The compact frame provides easy access to all major components.

Charging System
The easy manageable charging system will allow for a quick exchange of the loads and ensures a homogeneous coating.

Maintenance and Service
The large chamber door provides optimum cleaning, loading and maintenance facilities.
Access to the data is possible throughout the process as well as through remote control for remote maintenance.

Technical Data
Substrate

Material: HSS, cemented carbide

Tool diameter:

Triple rotation max. Ø 40 mm

Single rotation: max. Ø 450 mm

Substrate height: max. 485 mm

Load: max. 300 kg

Coating Chamber

Dimension: 750 x 775 x 700 mm (W x H x D)

Vacuum System

Rotary vane pump: 65 m³/h

Roots pump: 500 m³/h

Turbomolecular pump: 1450 l/s

Radiant Heater

Power: 2 x 10 kW

Substrate temperature: up to 500 °C

Bias Power Supply

Power: max. 30 kW

Voltage: max. 1000 V DC

Arc Evaporator

Quantity: 12 pieces

Target diameter: 100 mm (in SPCS mode 63 mm)

Current per cathode: max. 125 A

Power Requirements

Mains: TN-S 400/230 VAC / -5%, +3% / 50/60 Hz

Power: approx. 69 kVA

Product Information